Design of a lens system for micro lens lithography

Abstract

Micro lens lithography does not impose any limit on the mask and on the size of wafer area. The design details of a lens system for micro lens lithography are discussed in this paper. This system contains three micro lens arrays with aspheric surfaces. We simulate and optimize this system and increased resolution with geometrical and diffraction-based methods and using available commercial optical design software. © 2006 Optical Society of America.